Ex) Article Title, Author, Keywords
J. Korean Phy. Soc. 2007; 51(1): 178-182
Published online July 14, 2007 https://doi.org/10.3938/jkps.51.178
Copyright © The Korean Physical Society.
S. G. Lee, S. W. Shin, J. Lee, J.-H. Lee, J. H. Song, J.-Y. Choi, H. H. Lee and H. S. Lee
An epitaxial Ni(4.5 nm -- 100 nm)/Cu nanostructure has been fabricated on a Si(001) substrate by using nanoporous anodic aluminum oxide (AAO) as a mask during evaporation. Both the nanosized Cu and Ni layers have (001) surfaces with a Ni $<$110$>$ $//$ Cu $<$110$>$ $//$ Si $<$001$>$ in-plane relation. The Ni nanostructure is found to be less strained than the film at the same Ni thickness, which plays a crucial role in determining the magnetic anisotropy of the nanostructure. Combining a self-assembled AAO mask with a conventional evaporation method can be a potential technique, instead of traditional lithography, for the growth of various epitaxial metal nanostructures.
Keywords: Epitaxial Ni/Cu, Nnanostructure, AAO, Strain, Magnetic anisotropy
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