Organosilicate film and fluorinated amorphous carbon film have been deposited by inductively coupled plasma chemical vapor deposition with the precursor of carbon composition. The conjugated C=O and C=C double bonds in synthetic organic chemistry are very important to obtain the cross-link bonding structure of sp$^3$ carbon. For low-dielectric materials, the cross-link structure is also one of the reasons that the films have low dielectric constant and good adhesion. Organosilicate film of organic-inorganic hybrid type shows the chemical properties due to a C=O double bond. On the other hand, fluorinated amorphous carbon film of organic type shows the chemical properties due to a C=C double bond. The difference between C=O bond and C=C bond of these films is defined by Raman and FTIR spectra.