pISSN 0374-4884
eISSN 1976-8524

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Oh T, Choi CK.    Comparison between SiOC Thin Film by plasma enhance chemical vapor deposition and SiO2 Thin Film by Fourier Transform Infrared Spectroscopy  .  J. Korean Phy. Soc. 2010;56:1150-1155.  https://doi.org/10.3938/jkps.56.1150