pISSN 0374-4884
eISSN 1976-8524

Download to citation(s)
Oh T, Choi CK.    Comparison between SiOC Thin Film by plasma enhance chemical vapor deposition and SiO2 Thin Film by Fourier Transform Infrared Spectroscopy  .  JKPS 2010;56:1150-1155.  https://doi.org/10.3938/jkps.56.1150
* Please select a format and type blew.
Export type
Format