pISSN 0374-4884
eISSN 1976-8524

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Kim WH, Park SJ, Kim D, Kim H.  Atomic Layer Deposition of Ruthenium and Ruthenium-oxide ThinFilms by Using a Ru(EtCp)$_{2}$ Precursor and Oxygen Gas.  JKPS 2009;55:32-37.  https://doi.org/10.3938/jkps.55.32
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