Comparison of the Nano-Structure due to C=O and C=C Double Bond
J. Korean Phy. Soc. 2004; 45: 705~
Published online September 15, 2004 © 2004 The Korean Physical Society.

Abstract
Organosilicate film and fluorinated amorphous carbon film have been deposited by inductively coupled plasma chemical vapor deposition with the precursor of carbon composition. The conjugated C=O and C=C double bonds in synthetic organic chemistry are very important to obtain the cross-link bonding structure of sp$^3$ carbon. For low-dielectric materials, the cross-link structure is also one of the reasons that the films have low dielectric constant and good adhesion. Organosilicate film of organic-inorganic hybrid type shows the chemical properties due to a C=O double bond. On the other hand, fluorinated amorphous carbon film of organic type shows the chemical properties due to a C=C double bond. The difference between C=O bond and C=C bond of these films is defined by Raman and FTIR spectra.


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