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Comparison between SiOC Thin Film by plasma enhance chemical vapor deposition and SiO
2
Thin Film by Fourier Transform Infrared Spectroscopy
teresa OH
,
Chi Kyu Choi
J. Korean Phy. Soc. 2010; 56: 1150-1155
Full Text(PDF)
Comparison between Organic Thin Films Deposited by CCP-CVD and ICP-CVD
teresa oh
J. Korean Phy. Soc. 2009; 55: 1950-1954
Full Text(PDF)
Study on the Dielectric Constant and on the Degree of Amorphous Structure Induced in Fluorinated Amorphous Carbon Films by Using X-ray Diffraction
Teresa Oh
,
Kwang-Man Lee
,
Chi Kyu Choi
J. Korean Phy. Soc. 2009; 55: 1553-1556
Full Text(PDF)
Dependence of the Correlation between the Chemical Properties and the Current-Voltage Characteristics of Pentacene Channel OTFTs on the Surface Properties of SiOC Films
Teresa Oh
J. Korean Phy. Soc. 2007; 51: 528-533
Full Text(PDF)
Properties of Organic Thin-Film Transistors on Hybrid-Type Interlayer Dielectric Materials
Teresa Oh
,
Hong Bae Kim
J. Korean Phy. Soc. 2006; 49: 865-
Full Text(PDF)
Comparison of the Nano-Structure due to C=O and C=C Double Bond
Teresa Oh
,
Kwang-Man Lee
,
Kyung Sik Kim
and
Chi Kyu Choi
J. Korean Phy. Soc. 2004; 45: 705-
Full Text(PDF)
Hydrogen Bonding of Low-k Materials Deposited by ICPCVD
Teresa Oh
,
Kwang-Man Lee
,
Heon-Ju Lee
and
Chi Kyu Choi
J. Korean Phy. Soc. 2004; 44: 1118-
Full Text(PDF)
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