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Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
Kwang-Man Lee, Chang Young Kim, Chi Kyu Choi, R. Navamathavan
J. Korean Phy. Soc. 2011; 59: 3074-3079  
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Frequency-dependent Capacitance-Voltage and Conductance-Voltage Characteristics of Low-dielectric-constant SiOC(-H) Thin Films Deposited by Using Plasma-enhanced Chemical Vapor Deposition
Chi Kyu Choi, Chang Young Kim, Heang Seuk Lee, Jong-Kwan Woo, Rangaswamy Navamathavan, Kwang-Man Lee, Myung Taek Hyun
J. Korean Phy. Soc. 2010; 57: 1976-1982  
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Study on the Dielectric Constant and on the Degree of Amorphous Structure Induced in Fluorinated Amorphous Carbon Films by Using X-ray Diffraction
Teresa Oh, Kwang-Man Lee, Chi Kyu Choi
J. Korean Phy. Soc. 2009; 55: 1553-1556  
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Interface Properties of Nickel-silicide Films Deposited \by UsingPlasma-assisted Atomic Layer Deposition
Kwang-Man Lee, ChangYoung Kim, ChiKyu Choi, Sang-Won Yun, Jong-Bong Ha, Jung-Hee Lee, JeongYong Lee
J. Korean Phy. Soc. 2009; 55: 1153-1157  
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Morphological and Compositional Changes at the SiOC(-H)/{itp}-Si(100) Interface Region Prepared by Using PECVD
HeangSeuk Lee, ChangYoung Kim, R. Navamathavan, Jong-Kwan Woo, Younghun Yu, ChiKyu Choi, Kwang-Man Lee
J. Korean Phy. Soc. 2009; 55: 1087-1092  
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Nano-Mechanical Analyses of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
AnSoo Jung, ChangYoung Kim, R. Navamathavan, Jong-Kwan Woo, Kwang-Man Lee, ChiKyu Choi
J. Korean Phy. Soc. 2008; 53: 2512-2517  
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Structural and Electrical Characterizations of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using Plasma-Enhanced Chemical Vapor Deposition for ULSI Interconnects
Chang Young Kim, An Soo Jung, Rangaswamy Navamathavan, Chi Kyu Choi and Kwang-Man Lee
J. Korean Phy. Soc. 2008; 53: 371-375  
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Low-Dielectric-Constant SiOC(-H) Films Prepared from DMDMS and O2 Precursors by Using Plasma Enhanced Chemical Vapor Deposition
Seung Hyung Kim, R. Navamathavan, An Soo Jung, Yong Jun Jang, Kwang-Man Lee and Chi Kyu Choi
J. Korean Phy. Soc. 2007; 50: 1814-1818  
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Comparative Study on the Structural and Electrical Properties of Low-bftextitk SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition
Anvar Sagatovich Zakirov, Rangaswamy Navamathavan, Yong Jun Jang, An Soo Jung, Kwang-Man Lee and Chi Kyu Choi
J. Korean Phy. Soc. 2007; 50: 1809-1813  
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Deposition and Characterization of Low-Dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections
Rangaswamy Navamathavan, An Soo Jung, Hyun Seung Kim, Young Jun Jang, Chi Kyu Choi and Kwang-Man Lee
J. Korean Phy. Soc. 2007; 50: 1803-1808  
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