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Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
Kwang-Man Lee, Chang Young Kim, Chi Kyu Choi, R. Navamathavan
J. Korean Phy. Soc. 2011; 59: 3074-3079  
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Frequency-dependent Capacitance-Voltage and Conductance-Voltage Characteristics of Low-dielectric-constant SiOC(-H) Thin Films Deposited by Using Plasma-enhanced Chemical Vapor Deposition
Chi Kyu Choi, Chang Young Kim, Heang Seuk Lee, Jong-Kwan Woo, Rangaswamy Navamathavan, Kwang-Man Lee, Myung Taek Hyun
J. Korean Phy. Soc. 2010; 57: 1976-1982  
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? Electrical conduction in low dielectric constant SiOC(-H) films with nano-pore structure using dimethyldimethoxysilane /O2 precursors deposited by plasma-enhanced chemical vapor deposition
Chi Kyu Choi, Jong Kwan Woo, R. Navamathavan, Kwang Man Lee, Chang Young Kim, Heang Seuk Lee
J. Korean Phy. Soc. 2010; 56: 1478-1483  
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? Comparison between SiOC Thin Film by plasma enhance chemical vapor deposition and SiO2 Thin Film by Fourier Transform Infrared Spectroscopy ?
teresa OH, Chi Kyu Choi
J. Korean Phy. Soc. 2010; 56: 1150-1155  
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Preparation and Properties of Low Dielectric Constant SiOC(-H) Thin Films Deposited by Using PECVD
R. Navamathavan, Cheul Ro Lee, R. Nirmala, Chang Young Kim, Chi Kyu Choi
J. Korean Phy. Soc. 2010; 56: 818-822  
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A study on the Properties of Cu/SiOC(-H)/p-Si(100) and Cu/TaN/SiOC(-H)/p-Si(100) Interface
Chi Kyu Choi, Chang Young Kim, R. Navamathavan, Heang Seuk Lee, Younghun Yu, Jong-Kwan Woo
J. Korean Phy. Soc. 2009; 55: 1960-1964  
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Interface characterization and current conduction in low dielectric constant SiOC(-H) films with MIS structure
Chi Kyu Choi
J. Korean Phy. Soc. 2009; 55: 1955-1959  
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Study on the Dielectric Constant and on the Degree of Amorphous Structure Induced in Fluorinated Amorphous Carbon Films by Using X-ray Diffraction
Teresa Oh, Kwang-Man Lee, Chi Kyu Choi
J. Korean Phy. Soc. 2009; 55: 1553-1556  
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Plasma Diagnostics during Plasma-Enhanced Chemical-Vapor Deposition of Low-Dielectric-Constant SiOC(-H) Films from TES/O2 Precursors
R. Navamathavan, An Soo Jung, Chang Young Kim, Heon Ju Lee and Chi Kyu Choi
J. Korean Phy. Soc. 2008; 53: 1468-1474  
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Structural and Electrical Characterizations of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using Plasma-Enhanced Chemical Vapor Deposition for ULSI Interconnects
Chang Young Kim, An Soo Jung, Rangaswamy Navamathavan, Chi Kyu Choi and Kwang-Man Lee
J. Korean Phy. Soc. 2008; 53: 371-375  
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